Microwave enhanced CVD system under magnetic field

Details Microwave enhanced CVD system under magnetic field Microwave enhanced CVD system under magnetic field

1994-03-28

1996-04-30

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118723MA, 118723ME, 118723MR, 118744P, C23C 1600

Patent

active

055121020

ABSTRACT:
An improved chemical vapor deposition or etching is shown in which cyclotron resonance and photo or plasma CVD cooperate to deposit a layer with high performance at a high deposition speed. The high deposition speed is attributed to the cyclotron resonance while the high performance is attributed to the CVDs.

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