Microwave enhanced CVD method for depositing diamond

Details Microwave enhanced CVD method for depositing diamond Microwave enhanced CVD method for depositing diamond

1989-03-28

1991-05-14

Morgenstern, Norman

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427 35, 427 451, 427 47, 427122, 427249, 4272552, 423446, 118723, B05D 306

Patent

active

050154940

ABSTRACT:
A cyclotron resonance chemical vapor deposition method of making a diamond or diamond-like material on a substrate characterized by the use of a higher pressure range of 0.1 to 300 torr, where the substrate is approximately positioned where a standing wave of the applied microwave established in a reaction chamber attains a maximum value.

REFERENCES:
patent: 3944686 (1976-03-01), Froberg
patent: 4725345 (1988-02-01), Sakamoto
patent: 4743522 (1988-05-01), Iino et al.
patent: 4816286 (1989-03-01), Hirose
patent: 4816291 (1989-03-01), Desphandey et al.
patent: 4869923 (1989-09-01), Yamazaki
Kawarada et al. "Large Area Chemical Vapor Deposition of Diamond Particles and Films Using Magneto-Microwave Plasma" Jpn. J. Appl. Phys. 26(6), Jun. 1987, L1032-1034.

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