Microwave energized deposition process wherein the deposition is

Details Microwave energized deposition process wherein the deposition is Microwave energized deposition process wherein the deposition is

1991-12-23

1993-07-27

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437101, 437225, 437228, 437233, 427575, 427570, 118723, H01L 2100, H01L 2102, H01L 21326

Patent

active

052310485

ABSTRACT:
The glow discharge deposition of thin film materials is most advantageously carried out at a pressure which is less than the pressure of the minimum point on the deposition system's Paschen curve and at a power which is in excess of the minimum power required to sustain a deposition plasma at the particular process pressure.

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Wang, Effect of plasma pressure on the properties of a -Si:H, Philos. Mag., B., Mar. 1986, vol. 53(3), pp. 183-191.
Yang, Paschen curve and deposition kinetics in plasma process, Inter. Photovoltaic sci. and eng. conf., Tech. digest, Nov. 1984, pp. 723-725.

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