Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1989-01-27
1991-12-03
Beck, Shrive
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
118723, 219 1055A, 219 1055R, 315 39, 31511121, 427 38, C23C 1650
Patent
active
050699288
ABSTRACT:
A microwave plasma CVD apparatus includes a hermetically sealed vacuum vessel, a device for evacuating the vacuum vessel, and a device for introducing microwaves through a microwave transmission circuit into the vacuum vessel to produce a plasma within the vacuum vessel. The microwave transmission circuit includes a cavity resonator integrally provided with two matching circuits, one of which is a plunger for varying the length of the cavity resonator and the other of which is a pair of sliding matching irises. Feedback in the apparatus can be controlled by driving one of the matching circuits for rough matching of the microwave impedance and driving the other matching circuit for fine matching of the microwave impedance, so that the calculated ratio of the reflected power to the input power, based on a signal from a power monitor, is reduced to a minimum.
REFERENCES:
patent: 4207452 (1980-06-01), Arai
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4831963 (1989-05-01), Saito et al.
Echizen Hiroshi
Takaki Satoshi
Beck Shrive
Canon Kabushiki Kaisha
Owens Terry J.
LandOfFree
Microwave chemical vapor deposition apparatus and feedback contr does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microwave chemical vapor deposition apparatus and feedback contr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave chemical vapor deposition apparatus and feedback contr will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1696093