Microstructures and single mask, single-crystal process for fabr

Details Microstructures and single mask, single-crystal process for fabr Microstructures and single mask, single-crystal process for fabr

1994-09-27

1998-02-17

Niebling, John

Fishing, trapping, and vermin destroying

437203, 437 60, 1566431, 148DIG50, H01L 2144

Patent

active

057190739

ABSTRACT:
A single mask, low temperature reactive ion etching process for fabricating high aspect ratio, released single crystal microelectromechanical structures independently of crystal orientation.

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