Microstructures and high temperature isolation process for fabri

Details Microstructures and high temperature isolation process for fabri Microstructures and high temperature isolation process for fabri

1993-05-26

1995-06-20

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437228, 437921, 437919, H01L 2144

Patent

active

054260701

ABSTRACT:
A method of fabricating released microelectromechanical and microoptomechanical structures having electrically isolating segments from single crystal silicon includes thermal oxidation steps. The structures are defined using a single mask patterning process, and the structure is partially thermally oxidized. This is followed by a second masking step which is used to define segments to be completely thermally oxidized, and a second oxidation step completes the fabrication of the isolating segment. Thereafter the structure is released from the underlying substrate.

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