Microsensor with ferroelectric material and method for...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C257SE21208

Reexamination Certificate

active

07413912

ABSTRACT:
A microsensor fabricated with a ferroelectric material and a fabrication method therefor are provided. The microsensor includes a support, an insulating layer on the support, a first electrode on the insulating layer, a ferroelectric layer having at least a metal on the insulating layer and the first electrode, and at least a second electrode on the ferroelectric layer.

REFERENCES:
patent: 3934058 (1976-01-01), Seebacher
patent: 5241741 (1993-09-01), Sugaya
patent: 5252498 (1993-10-01), Yamazaki
patent: 5310990 (1994-05-01), Russell et al.
patent: 5316973 (1994-05-01), Wang et al.
patent: 5453908 (1995-09-01), Tsu et al.
patent: 5566046 (1996-10-01), Kulwicki
patent: 5796079 (1998-08-01), Kim et al.
patent: 5818043 (1998-10-01), Buchy et al.
patent: 5874379 (1999-02-01), Joo et al.
patent: 6210625 (2001-04-01), Matsushita et al.
patent: 6737282 (2004-05-01), Cheng et al.
patent: 2004/0175585 (2004-09-01), Zou et al.
patent: 2004/0217402 (2004-11-01), Andideh
patent: 2005/0015175 (2005-01-01), Huang
patent: 2006/0082423 (2006-04-01), Kim et al.
patent: 2007/0202036 (2007-08-01), Jongen et al.
patent: 02117090 (1990-05-01), None

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