Microscope imaging system and method for emulating a high...

Details Microscope imaging system and method for emulating a high... Microscope imaging system and method for emulating a high...

2007-10-23

2007-10-23

Allen, Stephone B. (Department: 2872)

Optical: systems and elements

Compound lens system

With image recorder

C382S144000, C382S149000, C356S364000, C359S900000

Reexamination Certificate

active

10917626

ABSTRACT:
An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.

REFERENCES:
patent: 5890095 (1999-03-01), Barbour et al.
patent: 6741356 (2004-05-01), Ishiwata et al.
patent: 7023546 (2006-04-01), McMillan

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