Microscope, especially microscope used for inspection in...

Optical: systems and elements – Diffusing of incident light

Reexamination Certificate

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C359S385000, C359S015000, C359S707000

Reexamination Certificate

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10875934

ABSTRACT:
A microscope, especially a microscope that is used for inspection in semiconductor manufacture is disclosed. The microscope comprises a pulsed laser for the purpose of illumination, preferably in the UV range. At least one rotating diffusion disk is disposed downstream of the laser so as to homogenize the illumination. Preferably, two rotating diffusion disks of opposite rotational sense are disposed in the illumination beam path either directly or indirectly one behind the other.

REFERENCES:
patent: 3490827 (1970-01-01), Snitzer et al.
patent: 4869593 (1989-09-01), Biegen
patent: 5233460 (1993-08-01), Partlo et al.
patent: 5365354 (1994-11-01), Jannson et al.
patent: 5534386 (1996-07-01), Petersen et al.
patent: 5737072 (1998-04-01), Emery et al.
patent: 6078393 (2000-06-01), Oohashi et al.
patent: 10-078668 (1998-03-01), None
XP-002160840—INSPEC Abstract of “Prbory 1 Tekhnika Eksperimenta” vol. 33, No. 4, “Low-loss diffusing element for suppresion of spurious interference from laser illuminator” A.D. Kudanov et al.
English translation of the Japanese reference No. 10-078668.

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