Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2005-12-06
2005-12-06
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C430S022000, C216S041000, C216S052000, C264S406000, C264S447000, C264S496000
Reexamination Certificate
active
06972844
ABSTRACT:
An illustrative object of the present invention is to provide a microprocessing apparatus by which an original and a substrate to be processed can be aligned with each other with a higher precision. Disclosed in this connection is an apparatus for transferring a pattern of an original onto a substrate while maintaining the original and the substrate in contact with each other or in close proximity to each other, wherein the apparatus includes an original holding device for holding the original, a substrate holding device for holding the substrate, a reference mark, and a position measuring system for measuring a relative positional relationship between the reference mark and a mark formed on at least one of the original and the substrate.
REFERENCES:
patent: 5772905 (1998-06-01), Chou
patent: 2002/0176096 (2002-11-01), Sentoku et al.
patent: 2003/0081213 (2003-05-01), Oishi et al.
patent: 2004/0021866 (2004-02-01), Watts et al.
Choi et al.; “Layer-to-Layer Alignment for Step and Flash Imprint Lithography”;Emerging Lithographic Technologies; Proceedings of SPIE; vol. 4343, pp. 436-442;(2001).
Lauchman Layla G.
Stock, Jr. Gordon J.
LandOfFree
Microprocessing apparatus, semiconductor device... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microprocessing apparatus, semiconductor device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microprocessing apparatus, semiconductor device... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3511945