Measuring and testing – Surface and cutting edge testing – Roughness
Patent
1992-03-16
1993-02-16
Raevis, Robert R.
Measuring and testing
Surface and cutting edge testing
Roughness
G01B 528
Patent
active
051860414
ABSTRACT:
A metrology system measures the depth and width of a trench in a sample to be tested with a probe moved relative to the sample. The system detects the proximity of the probe to a sample and to the side walls of the trench, providing output signals indicating the vertical and transverse relationship of the probe to the sample. The system adjusts the relative position of the probe and the sample vertically and transversely as a function of the output signals. The probe has three protuberances to detect the depth and width of the trench. One protuberance extends down to sense the bottom of the trench. Lateral protuberances extend in opposite directions (across the width of the trench) from the probe to detect the side walls of the trench. Forces on the protuberances are measured to determine the depth and the location of the side walls of the trench.
REFERENCES:
patent: 4168576 (1979-09-01), McMurtry
patent: 4434559 (1984-03-01), Lauer et al.
patent: 4603487 (1986-08-01), Matsunata
patent: 4621434 (1986-11-01), Hirschmann
patent: 4788772 (1988-12-01), Van Sickle et al.
patent: 4987303 (1991-01-01), Takase et al.
patent: 5025658 (1991-06-01), Elings et al.
patent: 5036196 (1991-07-01), Hosaka et al.
G. Binnig, et al, "Atomic Force Microscope" Physical Review Letter, vol. 56, No. 9, pp. 930-933 (Mar. 3, 1986).
Y. Martin, et al, "Atomic Force Microscope-force Mapping and Profiling on a Sub 100-Angstroms Scale" J. Appl. Phys. 61 (10) pp. 4723-4729 (May 15, 1987).
D. Nyyssonen, "A New Approach to Image Modeling and Edge Detection in the SEM" To be published Proc. SPIE, vol. 921, pp. 48-56 (Mar. 1988).
T. R. Albrecht, et al, "Atomic Resolution with the Atomic Force Microscope on Conductors and Nonconductors" J. Vac. Sci. Technol. A6 (2) pp. 271-274 (Mar./Apr. 1988).
"Microprobe-Based CD Measurement Tool" IBM Technical Disclosure Bulletin, vol. 32, No. 7, p. 168 (Dec. 1989).
D. Rugar et al., "Atomic Force Microscopy" Physics Today, pp. 23-30 (Oct. 1990).
T. Fujii, et al., "Micro Pattern Measurement with an Atomic Force Microscope"International Meeting of STM 1990/Nano I in Baltimore, MD pp. 1-15.
Claim 1 and Figure of U.S. Pat. No. 4,506,154 in Official Gazette.
International Business Machines - Corporation
Jones II Graham S.
Raevis Robert R.
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