Micropattern-forming material having a low molecular weight novo

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430165, 430191, 430192, 430193, G03F 7023, G03F 730

Patent

active

053806182

ABSTRACT:
A micropattern-forming, light sensitive resin composition is disclosed. The composition comprises (a) a novolak resin comprising a condensate between formaldehyde and a mixture of m-cresol and p-cresol with a m-cresol to p-cresol charging weight ratio of from 45/55 to 60/40, wherein the novolak resin has the following characteristics: (i) a dissolving rate of 20 to 800 .ANG./sec in an aqueous solution of tetramethylammonium hydroxide (TMAH) and an alkali activity of 0.131N, (ii) a weight average molecular weight of 1000 to 6000 calculated as polystyrene equivalent, and (iii) a non-exposed dissolving rate of equal to or more than 100 .ANG./sec in an aqueous solution of TMAH with an alkali activity of 0.262N; (b) a light-sensitive substance of 1,2-naphthoquinonediazide-4-sulfonyl ester, and (c) a solvent capable of dissolving the novolak resin and the light-sensitive substance; wherein the novolak resin, the light-sensitive substance, and the solvent are present in such amounts that a 1.0 micron thick resist formed of the material has an optical density at 382 nm of 0.1 to 0.4 .mu.m.sup.-1. Also described is a micropattern-forming process having the steps of: (1) spin coating a substrate with the light-sensitive resin composition; (2) drying the light-sensitive composition; (3) exposing the dried light-sensitive composition using deep UV having a wavelength not longer than about 320 nm; and (4) developing the exposed light-sensitive composition.

REFERENCES:
patent: 3666473 (1972-05-01), Colom et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4529682 (1985-07-01), Toukhy
patent: 4626492 (1986-12-01), Eilbeck
patent: 4847178 (1989-07-01), Komano
patent: 4863829 (1989-09-01), Furuta et al.
patent: 4883739 (1989-11-01), Sakaguchi et al.
patent: 4906549 (1990-03-01), Asaumi et al.
patent: 4943511 (1990-07-01), Lazarus et al.
patent: 4957846 (1990-09-01), Jeffries, III et al.
patent: 4959292 (1990-09-01), Blakeney et al.
patent: 4965167 (1990-10-01), Salamy et al.
European Search Report, 90106075.6, Vienna, Jul. 29, 1991, Hammer.
Chemical Abstracts, vol. 108, No. 26, Jun. 27, 1988, p. 535, No. 229671r.
Chemical Abstracts, vol. 109, No. 20, Nov. 14, 1988, p. 684, No. 180449d.
Chemical Abstracts, vol. 105, No. 16, Oct. 20, 1986, p. 654, No. 143595v.
Chemical Abstracts, vol. 102, No. 8, Feb. 25, 1985, p. 543, No. 70249m.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Micropattern-forming material having a low molecular weight novo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Micropattern-forming material having a low molecular weight novo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Micropattern-forming material having a low molecular weight novo will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-849963

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.