Liquid purification or separation – Processes – Chemical treatment
Patent
1994-11-14
1997-01-07
Nessler, Cynthia L.
Liquid purification or separation
Processes
Chemical treatment
210764, 210192, 210205, C02F 178
Patent
active
055913490
ABSTRACT:
An organism deposition preventing system for removing organisms propagated in water comprises: an ozonizer for generating ozone, an ozone adsorber containing an ozone adsorbent for storing ozone generated by the ozonizer, a water-jet ejector for injecting an ozonous gas produced by desorbing ozone from the ozone adsorbent of the ozone absorber into the water, and a carbon dioxide gas source means for supplying carbon dioxide gas to be injected into the water together with the ozonous gas or in synchronism with the injection of the ozonous gas into the water. A microorganism removing method for removing microorganisms propagated in water injects a mixed gas consisting of an ozonous gas and carbon dioxide gas into the water or injects carbon dioxide gas in synchronism with the injection of the ozonous gas into the water.
REFERENCES:
patent: 3805481 (1974-04-01), Armstrong
patent: 3856671 (1974-12-01), Lee et al.
patent: 3997631 (1976-12-01), Matsuoka et al.
patent: 4100421 (1978-07-01), Tabata et al.
patent: 4136027 (1979-01-01), Sakamoto et al.
patent: 4172786 (1979-10-01), Humphrey et al.
patent: 4352740 (1982-10-01), Grader et al.
patent: 4430306 (1984-02-01), Namba et al.
patent: 4453953 (1984-06-01), Tanaka et al.
patent: 4462965 (1984-07-01), Azuma et al.
patent: 4552659 (1985-11-01), Tabata et al.
patent: 4767528 (1988-08-01), Sasaki et al.
patent: 5075016 (1991-12-01), Barnes
patent: 5145585 (1992-09-01), Coke
patent: 5186841 (1993-02-01), Schick
patent: 5275742 (1994-01-01), Satchell, Jr. et al.
Ozone Science & Engineering "Anti-Biofouling Ozone System for Cooling Water Circuits" 1985, pp. 31-46.
Ezaki Kenji
Ikeda Akira
Nakatsugawa Naoki
Tanimura Yasuhiro
Yoshimura Yumiko
Mitsubishi Denki & Kabushiki Kaisha
Nessler Cynthia L.
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