Micron gap thermal photovoltaic device and method of making...

Details Micron gap thermal photovoltaic device and method of making... Micron gap thermal photovoltaic device and method of making...

2011-07-12

2011-07-12

Geyer, Scott B (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

C438S057000, C438S064000, C438S066000, C438S069000

Reexamination Certificate

active

07977135

ABSTRACT:
A method of making a micron gap thermal photovoltaic device includes forming at least one standoff on a photovoltaic substrate, depositing a sacrificial layer on the photovoltaic substrate and about the standoff, forming an emitter attached to the standoff and having a lower planar surface separated from the photovoltaic substrate by the sacrificial layer, and removing the sacrificial layer to form a sub-micron gap between the photovoltaic substrate and the lower planar surface of the emitter.

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