Micromirror having counterbalancing structures and method...

Optical: systems and elements – Mirror – Including specified control or retention of the shape of a...

Reexamination Certificate

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C359S838000, C359S877000

Reexamination Certificate

active

06846087

ABSTRACT:
A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.

REFERENCES:
patent: 4343333 (1982-08-01), Keister
patent: 6074475 (2000-06-01), Harrison et al.
patent: 6720682 (2004-04-01), Hatam-Tabrizi et al.

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