Microminiature solid state device manufacture with automatic ali

Details Microminiature solid state device manufacture with automatic ali Microminiature solid state device manufacture with automatic ali

1980-12-15

1983-03-22

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 5, 430311, 430313, 430314, 430296, 430319, 430394, 430396, 430494, 430967, G03C 500, G03F 900, G01N 2100, H01L 2102

Patent

active

043776272

ABSTRACT:
A semiconductor substrate is mounted in an electron beam image projector with a mask. The patterned electron beam from the mask comprises a first sub-pattern and a second lower intensity sub-pattern. The difference in the intensities of the two sub-patterns permits the automatic alignment of the patterned electron beam relative to the substrate by detecting when the first sub-pattern is incident on a reference marker pattern on the substrate, while the first and second sub-patterns together expose an electron sensitive layer at the entire area of the reference marker pattern. The part of the layer retained after developing can be used as an etchant mask during the definition of a protective layer or the removal of unwanted material from the entire area of the reference marker pattern depending on whether the layer is a negative or a positive electron sensitive material.

REFERENCES:
patent: 3245794 (1966-04-01), Conley
patent: 3607267 (1971-09-01), Garrels
patent: 3742229 (1973-06-01), Smith
patent: 4118230 (1978-10-01), Binder

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