Micromesh material and micromesh mono-crystal high frequency...

Details Micromesh material and micromesh mono-crystal high frequency... Micromesh material and micromesh mono-crystal high frequency...

2008-09-09

2008-09-09

Vu, David (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S250000, C438S089000

Reexamination Certificate

active

10304737

ABSTRACT:
This invention is related to a micromesh material and a mono-crystal high frequency capacitor manufactured with said micromesh material as well as the producing method for the mono-crystal high frequency capacitor, i.e., disperse a colloidal material unevenly to form a sub-micrometer ceramic cell structure to get a micromesh mono-crystal material on the basis of the theory of liquid-liquid phase transformation, and produce capacitors with the obtained material to enhance the high frequency characteristics of those capacitors with the micromesh mono-crystal structure (air medium) of dielectric ceramics.

REFERENCES:
patent: 6753277 (2004-06-01), Terashi

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