Micromechanical device having an improved beam

Details Micromechanical device having an improved beam Micromechanical device having an improved beam

1995-02-27

1997-12-09

Sheehan, John

Optical: systems and elements

Deflection using a moving element

By moving a reflective element

348770, 348771, 148423, 420431, G02B 2608

Patent

active

056966199

ABSTRACT:
An electrically addressable, integrated, monolithic, micromirror device (10) is formed by the utilization of sputtering techniques, including various metal and oxide layers, photoresists, liquid and plasma etching, plasma stripping and related techniques and materials. The device (10) includes a selectively electrostatically deflectable mass or mirror (12) of supported by one or more beams (18) formed by sputtering and selective etching. The beams (18) are improved by being constituted of an impurity laden titanium-tungsten layer (52) with an impurity such as nitrogen, which causes the beams to have lattice constant different from TiW. The improved beams (18) exhibit increased strength, and decreased relaxation and creep.

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