Micromachining of polytetrafluoroethylene using radiation

Plastic and nonmetallic article shaping or treating: processes – Direct application of electrical or wave energy to work – High energy or particulate radiation

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264400, 4251744, 378 68, 378 69, C08J 700, B29C 7104

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active

057309248

ABSTRACT:
A method of micromachining polytetrafluoroethylene by applying radiation light to the surface of polytetrafluoroethylene, includes the steps of: preparing a workpiece including a region made of polytetrafluoroethylene; preparing a mask having patterned areas substantially transmitting and not transmitting the radiation light; and applying the radiation light containing at least ultraviolet rays of a wavelength of 160 nm to a surface of the workpiece through the mask. Polytetrafluoroethylene can be microscopically processed, while obtaining a high aspect ratio and processing a large area with ease.

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patent: 5555549 (1996-09-01), Nakaishi
Article entitled "Ablation of Polytetrafluorethylene (Teflon) With Femtosecond UV Excimer Laser Pulses" by S. Kuper and M. Stuke, Appl. Phys. Lett. (54(1), Jan. 2, 1989, pp. 4-6.
Article entitled "Direct Photoetching of Polymer Films Using Vaccum Ultraviolet Radiation Generated by High-Order Anti-Stokes Raman Scattering", by Satoshi Wada, et al, Appl. Phys. Lett. 62(3), Jan. 18, 1993, pp. 211-213.
Lamda Highlights No. 25, a Publication by Lamda Physic, Oct., 1990, pp. 1 and 2.

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