Micromachined probes for nanometer scale measurements and method

Details Micromachined probes for nanometer scale measurements and method Micromachined probes for nanometer scale measurements and method

1997-04-30

1999-10-19

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

250306, H01J 3726

Patent

active

059693452

ABSTRACT:
A submicrometer photodiode probe with a sub-50 nanometer tip radius is used for optical surface characterization on a nanometer scale. The nanoprobe detects subwavelength optical intensity variations in the near field of an illuminated surface. The probe comprises a metal-semiconductor Schottky diode that is constructed at the end of a micromachined tip of a semiconductor wafer. A process is disclosed for micromachining the tip of the semiconductor wafer and then of creating a photodiode at the tip, with the photodiode having an optical aperture of a size less than 1000 nanometers.

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