Micromachined integrated pressure sensor with oxide polysilicon

Details Micromachined integrated pressure sensor with oxide polysilicon Micromachined integrated pressure sensor with oxide polysilicon

1995-01-19

1996-07-02

Chilcot, Richard

Measuring and testing

Fluid pressure gauge

Diaphragm

73720, 73721, G01L 1302, G01L 1306

Patent

active

055311210

ABSTRACT:
A method is disclosed for micromachining the surface of a silicon substrate which encompasses a minimal number of processing steps. The method involves a preferential etching process in which a chlorine plasma etch is capable of laterally etching an N+ buried layer beneath the surface of the bulk substrate. Such a method is particularly suitable for forming sensing devices which include a small micromachined element, such as a bridge, cantilevered beam, membrane, suspended mass or capacitive element, which is supported over a cavity formed in a bulk silicon substrate. The method also permits the formation of such sensing devices on the same substrate as their controlling integrated circuits. This invention also provides novel methods by which such structures can be improved, such as through optimizing the dimensional characteristics of the micromachined element or by encapsulating the micromachined element.

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