Micromachined electromechanical device

Details Micromachined electromechanical device Micromachined electromechanical device

2007-04-24

2007-04-24

Coleman, W. David (Department: 2823)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

C438S800000, C483S020000

Reexamination Certificate

active

11273827

ABSTRACT:
A method for fabricating a MEMS device comprises providing a substrate having a back side, a front side opposite to the back side and a periphery portion. A desired microstructure is formed on the back side of the substrate. The substrate is then supported for rotation. A precursor solution is deposited on the front side of the substrate during rotation so that a thin film layer may be formed thereon. During formation of the thin film layer, the substrate is supported and rotated that the microstructure formed on the back side is protected.

REFERENCES:
patent: 5962081 (1999-10-01), Ohman et al.
patent: 6093579 (2000-07-01), Sathe
patent: 6265750 (2001-07-01), Feng et al.
patent: 6612535 (2003-09-01), Tai et al.

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