Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-07-24
1998-12-22
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430394, G03F 900
Patent
active
058517073
ABSTRACT:
Methods and apparatus are disclosed for microlithographically exposing a photosensitive substrate comprising single-exposure areas and multiple-exposure areas. After exposing the substrate, line widths in the single-exposure areas are substantially the same as line widths in the multiple-exposure areas. Also disclosed are masks comprising a first mask pattern used to expose the single-exposure areas once and a plurality of other mask patterns for exposing the multiple-exposure areas a predetermined number of times. Each of the other mask patterns allows a lower intensity of illumination light flux to be distributed to the multiple-exposure areas per exposure of the substrate than allowed by the first mask pattern. Consequently, the average intensity of illumination-light flux distributed to the single-exposure area after one exposure is substantially equal to the average intensity of illumination-light flux distributed to the multiple-exposure areas after a predetermined number of exposures of such areas.
REFERENCES:
patent: 5532090 (1996-07-01), Borodovsky
Okamoto Kazuya
Ooki Hiroshi
Owa Soichi
Shibuya Masato
Nikon Corporation
Rosasco S.
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