Microlithography illumination systems, components and methods

Details Microlithography illumination systems, components and methods Microlithography illumination systems, components and methods

2011-08-02

2011-08-02

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000, C356S121000

Reexamination Certificate

active

07990520

ABSTRACT:
The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.

REFERENCES:
patent: 6195201 (2001-02-01), Koch et al.
patent: 6452661 (2002-09-01), Komatsuda
patent: 6658084 (2003-12-01), Singer
patent: 2002/0085286 (2002-07-01), Drodofsky et al.
patent: 2003/0227603 (2003-12-01), Dierichs
patent: 2004/0114123 (2004-06-01), Mudler et al.
patent: 2005/0270513 (2005-12-01), Dierichs et al.
patent: 2008/0113281 (2008-05-01), Maul et al.
patent: 100 43 315 (2002-06-01), None
patent: 10 2004 063 314 (2006-07-01), None
patent: 1 291 721 (2003-03-01), None
patent: WO 2006/136353 (2006-12-01), None

Affiliated with

Also associated with

Rating

Microlithography illumination systems, components and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microlithography illumination systems, components and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microlithography illumination systems, components and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2718275