Microlithographic system using a charged particle beam

Details Microlithographic system using a charged particle beam Microlithographic system using a charged particle beam

1980-11-17

1983-11-29

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37147

Patent

active

044182830

ABSTRACT:
A sample on which pre-established patterns are to be defined is rigidly fixed to a moving object-holder and subjected to bombardment with a beam of charged particles by means of a microlithographic system. This system comprises an array of elements placed in one plane in a predetermined spatial configuration and an imaging system having a magnification which is considerably less than unity, the elements being each capable of assuming two distinct states. A narrow beam of charged particles which emerges from each element is on-off modulated according to the state assumed by the element under the control of logic circuits.
The plane of the sample is adapted to correspond to the plane of the elements with respect to the imaging system and the elements are disposed at the intersections of the lines and columns of a matrix. The logic circuits permit the sequential application of a suitable voltage in accordance with a program which is pre-established in relation to the patterns to be drawn and in synchronism with the displacement of the object-holder.

REFERENCES:
patent: 3278679 (1966-10-01), Newberry
patent: 3900737 (1975-08-01), Collier et al.
patent: 3998678 (1979-12-01), Fukase et al.
patent: 4063103 (1977-12-01), Sumi
patent: 4088896 (1978-05-01), Elkins et al.
patent: 4130761 (1978-12-01), Matsuda
patent: 4153843 (1979-05-01), Pease

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