Microlithographic system

Photocopying – Contact printing – Light boxes

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Details

350584, 350589, 350418, 355 18, G02B 312, G02B 700

Patent

active

046169083

ABSTRACT:
In the microlithographic system disclosed herein, the spaces between elements in a projection lens are filled with flowing helium gas which substantially reduces the refraction errors caused by barometric changes in the atmosphere, even though the portions of the optical path outside the lens are exposed to the atmosphere.

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patent: 4331388 (1982-05-01), McCrobie et al.
patent: 4477183 (1984-10-01), Kawamura et al.
Nikar Precision Inc-Description of Pressure Compensated System.

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