Microlithographic reduction projection catadioptric objective

Details Microlithographic reduction projection catadioptric objective Microlithographic reduction projection catadioptric objective

2007-05-15

2007-05-15

Robinson, Mark A. (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S731000

Reexamination Certificate

active

10438153

ABSTRACT:
A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.

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