Optical: systems and elements – Single channel simultaneously to or from plural channels – By refraction at beam splitting or combining surface
Reexamination Certificate
2006-04-18
2006-04-18
Sugarman, Scott J. (Department: 2873)
Optical: systems and elements
Single channel simultaneously to or from plural channels
By refraction at beam splitting or combining surface
C359S487030, C359S737000, C359S900000
Reexamination Certificate
active
07031069
ABSTRACT:
A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.
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Gruner Toralf
Maul Manfred
Von Buenau Rudolf
Carl Zeiss Smt AG
Collins Darryl J.
Sugarman Scott J.
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