Photocopying – Projection printing and copying cameras – Illumination systems or details
Patent
1997-02-20
2000-10-17
Epps, Georgia
Photocopying
Projection printing and copying cameras
Illumination systems or details
355 43, 355 77, G03B 2754
Patent
active
061339865
ABSTRACT:
A microscopy and/or lithography system uses a comparatively low-resolution image projection system, which has a very small numerical aperture but large image field, in conjunction with a microlens array comprising miniature lens elements, each of which has a large numerical aperture but very small field. The projection system contains a small aperture stop which is imaged by the microlenses onto an array of diffraction-limited microspots on the microscope sample or printing surface at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the source of much of the complexity and expense of conventional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over very large image fields (larger than the practical limits of conventional imaging means). In one embodiment it would use a Digital Micromirror Device as the image source, potentially eliminating the need for photomasks in semiconductor manufacture.
REFERENCES:
patent: 3013467 (1961-12-01), Minsky
patent: 4101210 (1978-07-01), Lo et al.
patent: 4289377 (1981-09-01), Matsui et al.
patent: 4631581 (1986-12-01), Carlsson
patent: 4668080 (1987-05-01), Gale et al.
patent: 5032720 (1991-07-01), White
patent: 5160962 (1992-11-01), Miura et al.
patent: 5225929 (1993-07-01), Ulanowski
patent: 5239178 (1993-08-01), Derndinger et al.
patent: 5245369 (1993-09-01), Um et al.
patent: 5260826 (1993-11-01), Wu
patent: 5418599 (1995-05-01), Kamon
patent: 5459578 (1995-10-01), Park et al.
patent: 5473393 (1995-12-01), Manabe
patent: 5495279 (1996-02-01), Sandstrom
patent: 5517279 (1996-05-01), Hugle et al.
patent: 5541679 (1996-07-01), Yang
patent: 5617181 (1997-04-01), Yanagihara et al.
patent: 5659420 (1997-08-01), Wakai et al.
patent: 5680200 (1997-10-01), Sugaya et al.
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5724121 (1998-03-01), McKinley et al.
patent: 5737064 (1998-04-01), Inoue et al.
patent: 5739899 (1998-04-01), Nishi et al.
Tiziani, H.J. et al., "Theoretical analysis of confocal microscopy with microlenses," Applied Optics, vol. 35 (1) ; Jan. 1, 1996, pp. 120-125.
Tiziani, Hans J. et al., "Three-dimensional analysis by a microlens-array confocal arrangement," Applied Optics, vol. 33 (4) Feb. 1, 1994, pp. 567-572.
Hutley, M.C., in Micro-Optics, Elements, Systems and Applications, (Herzig, Hans Peter, Ed., Taylor & Francis Publishers, Bristol, PA), pp. 140-142, 151-152 (1997).
Seltmann, R. et al., "New System for Fast Submicron Optical Direct Writing," Microelectronic Engineering 30 (1996), pp. 123-127.
Smith, Henry I., "A Proposal for Maskless, Zone-Plate-Array Nanolithography," J. Vac. Sci. Technology, B14(6), Nov./Dec. 1996, pp. 4318-4322.
Brakenhoff G. J., "Imaging Modes in Confocal Scanning Light Microscopy (CSLM)," Journal of Microscopy, Nov. 1979, vol. 117, p:2, pp. 233-242.
Cox I. J. et al., "Scanning Optical Microscope Incorporating a Digital Framestore and Microcomputer," Applied Optics, May 15, 1983, vol. 22, No. 10, pp. 1474-1478.
Eisner Martin et al., "Transferring Resist Microlenses Into Silicon by Reactive Ion Etching," Opt. Eng., Oct. 1996, vol. 35, No. 10, pp. 2979-2982.
Gratix Edward J. et al., "Fabrication of Microlenses by Laser Assisted Chemical Etching (LACE)," SPIE Miniature and Micro-Optics Fabrication and System Applications, 1991, vol. 1544, pp. 238-243.
Hamilton D. K. et al., "Three Dimensional Surface Measurement Using the Confocal Scanning Microscope," Applied Physics B, 1982, B 27, pp. 211-213.
Sampsell Jeffrey Dr., "An Overview of the Performance Envelope of Digital Micromirror Device (DMD) Based Projection Display Systems," DMD Display, 1994, Digital Imaging Venture Project, Texas Instrument Incorporated, Dallas, Texas, "Society for Information Displays," pp. 1-4.
Suganuma Hiroshi et al., "Deep UV Lithography Using Continous-Wave 266nm Radiation From All Solid-State Frequency Quadrupled Nd:YAG Laser," Proceedings of the SPIE--The International Society for Optical Engineering (USA), Feb. 22-24, 1995, vol. 2440, pp. 126-135.
Volker Reinhard et al., "Microlens Array Imaging System for Photolithography," Optictal Engineering, Nov. 1996, vol. 35, No. 11, pp. 3323-3330.
Epps Georgia
Thompson Timothy J.
LandOfFree
Microlens scanner for microlithography and wide-field confocal m does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microlens scanner for microlithography and wide-field confocal m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microlens scanner for microlithography and wide-field confocal m will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-474532