Microlens, method of manufacturing microlens, and photomask...

Optical: systems and elements – Lens – With multipart element

Reexamination Certificate

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C359S811000

Reexamination Certificate

active

07843649

ABSTRACT:
A method of fabricating a microlens that serves to prevent damage thereto in the fabrication process is provided. First, a lens body of which the maximum height housed within a recess is lower than the height of the side wall of the recess is formed in the lens formation region by performing patterning that transfers the shape of a first resist pattern to a substrate by using the first resist pattern as an etching mask. Thereafter, a partial region of the substrate which is outside the lens formation region is removed to form an outline by using a second resist pattern as a mask.

REFERENCES:
patent: 7027693 (2006-04-01), Maeno et al.
patent: 7345832 (2008-03-01), Shibuya et al.
patent: 3117886 (1996-06-01), None
patent: 2004-085873 (2004-03-01), None

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