Microlens for projection lithography and method of...

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S055000

Reexamination Certificate

active

07403338

ABSTRACT:
Methods and systems for effecting responses on surfaces utilizing microlens arrays including microoptical components embedded or supported by a support element and positioned from the surface at a distance essentially equal to the image distance of the microoptical component with spacer elements are disclosed. Microlens arrays can be used to manipulate incident energy or radiation having a distribution in characteristic property(s) defining an object pattern to form a corresponding image pattern on a substrate surface. The energy can be light having a pattern or a specific wavelength, intensity or polarization or coherence alignment. The image pattern can have features of order 100 nm in size or less produced from corresponding object patterns having features in the order millimeters. The size of the object pattern can be reduced by the microlens arrays described by a factor of 100 or more using a single step process to form the image patterns.

REFERENCES:
patent: 3838358 (1974-09-01), Vanderleeden
patent: 4689291 (1987-08-01), Popovic et al.
patent: 4986633 (1991-01-01), Ohta
patent: 5324623 (1994-06-01), Tsumori
patent: 5373335 (1994-12-01), Street
patent: 5450157 (1995-09-01), Rees
patent: 5453876 (1995-09-01), Hamada
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5517279 (1996-05-01), Hugle et al.
patent: 5627923 (1997-05-01), Kakizaki
patent: 5723264 (1998-03-01), Robello et al.
patent: 5774240 (1998-06-01), Gotto et al.
patent: 5900160 (1999-05-01), Whitesides et al.
patent: 5973844 (1999-10-01), Burger
patent: 6016185 (2000-01-01), Cullman et al.
patent: 6031619 (2000-02-01), Wilkens et al.
patent: 6051836 (2000-04-01), Kirihata et al.
patent: 6057925 (2000-05-01), Anthon
patent: 6124974 (2000-09-01), Burger
patent: 6133986 (2000-10-01), Johnson
patent: 6172814 (2001-01-01), Watanabe et al.
patent: 6180239 (2001-01-01), Whitesides et al.
patent: 6195201 (2001-02-01), Kock
patent: 6200709 (2001-03-01), Nuytkens et al.
patent: 6545739 (2003-04-01), Matsumoto et al.
patent: 6594415 (2003-07-01), Cappiello et al.
patent: 6600460 (2003-07-01), Mays
patent: 6766094 (2004-07-01), Smith et al.
patent: 6800860 (2004-10-01), Dietz et al.
patent: 6841096 (2005-01-01), Quake et al.
patent: 6930837 (2005-08-01), Shafer et al.
patent: 7057832 (2006-06-01), Wu et al.
patent: 7106519 (2006-09-01), Aizenberg et al.
patent: 7115853 (2006-10-01), Jiang et al.
patent: 2003/0031438 (2003-02-01), Kambe et al.
patent: 1054270 (2000-11-01), None
patent: 06-075105 (1994-10-01), None
patent: 07-209506 (1995-08-01), None
patent: WO 94/11781 (1994-05-01), None
patent: WO 02/084340 (2002-10-01), None
Aizenberg, J. et al., “Imaging the irradiance distribution in the optical near field,”Appl. Phys. Lett., vol. 71, No. 26, 1997, pp. 3773-3775.
Aizenberg, J. et al., “Imaging profiles of light intensity in the near field: applications to phase-shift photolithography,”Applied Optics, vol. 37, No. 11, 1998, pp. 2145-2152.
Alkaisi, M. et al., “Nanlithography using wet etched silicon nitride phase masks,”J. Vac. Sci. Technol. B, 16, 1998, pp. 3929-3933.
Berger, C. et al., “A microlens-array-based optical neural network application,” Pure Appl. Opt., vol. 6, 1997, pp. 683-689.
Bohren, C. “Scattering By Particles,”Physical Optics, Chap. 6, Penn. State U., 6.1-6.21.
Brody, J. et al., “A self-assembled microlensing rotational probe,”Applied Physics Letters, vol. 74, No. 1, 1999, pp. 144-146.
Byrne, D.M. et al., “Infrared mesh filters fabricated by electron-beam lithography,”J. Vac. Sci. Technol., B3(1), 1985, pp. 268-271.
Dändliker, R. et al., “Non-conventional techniques for optical lithography,”Microelectronic Engineering27 (1995), pp. 205-211.
Denkov, N. et al., “Mechanism of Formation of Two-Dimensional Crystals from Latex Particles on Substrates,”Langmuir1992, 8, pp. 3183-3190.
Djomehri, I. et al., “Zone-plate-array lithography in the deep ultraviolet,”J. Vac. Sci. Technol, B 16(6), 1998, pp. 3426-3429.
Friese, M. et al,. “Three-dimensional imaging with optical tweezers,”Applied Optics, 1999, vol. 38, No. 31, pp. 6597-6603.
Goodberlet, J. G., “Patterning 100 nm features using deep-ultraviolet contact lithography,”Appl. Phys. Lett. 76, 667-669 (2000).
Gorman, C. et al., “Use of a Patterned Self-Assembled Monolayer To Control the Formation of a Liquid Resist Pattern on a Gold Surface,” Reprinted fromChemistry of Materials, 1995, 7. vol. 7, No. 2, 1995, pp. 252-254.
Gupta, S. et al., “Infrared filters using metallic photonic band gap structures on flexible substrates,”App. Physics. Letter, 71 (17), 1997, pp. 2412-2414.
Hayashi, S. et al., “Imaging by Polystyrene Latex Particles,”Journal of Collond and Interface Science, vol. 144, No. 2, 1991, pp. 538-547.
Ida, M. et al., “LETI's FED Patterning technique,”European Semiconductor, 1997.
Ida, M. et al., “ New Microlithography Technique for Large Size Field Emission Displays,”Euro Display 1996, p. 177-180.
Jacoby, M., “Photonic Crystals: Whole Lotta Holes,” C&EN Chicago,Science Technology, 1998 C&EN, pp. 38-43.
Joannopoulos, J. et al., “Photonic crystals: putting a new twist on light,”Nature, vol. 386, 1997, pp. 143-149.
Kim, E. et al., “Solvent-Assisted Microcontact Molding: A Convenient Method for Fabricating Three-Dimensional Structures on Surfaces of Polymers,”Advanced Materials, 1997, v. 9, No. 8, pp. 651-654.
Kim, E. et al., “Fabrication of Arrays of Channel Waveguides by Self-Assembly Using Patterned Organic Monolayers as Templates,”Advanced Materials, 1996, 8, No. 2, pp. 139-142.
Kogler, K. et al., “Infrared filters fabricated from submicron loop antenna arrays,”Applied Optics, vol. 27, No. 1, 1998, pp. 18-19.
Kumar, A. et al., “Patterned Condensation Figures as Optical Diffraction Gratings,”Science, vol. 263, Jan. 7, 1994, pp. 60-62.
Levi, Goss B., “Visible Progress Made in Three-Dimensional Photonic Cystals,” by:,Physics Today, 1999, pp. 17-19.
Milster, T. “Miniature and Micro-Optics,” by:,Optical Sciences Center University of Arizona, Chap. 7, pp. 7.1-7.33.
Nussbaum, P. et al., “Design, fabrication and testing of microlens arrays for sensors and microsystems,”Pure Appl., Opt 6, 1997, pp. 617-636.
Qin et al., “Photolithography with Transparent Reflective Photomasks,”J. Va. Sci. Technol., B16(1), pp. 98-103 (Jan./Feb. 1998).
Richel, A. et al., “Observation of Bragg reflection in photonic crystals synthesized from air spheres in a titania matrix,”Applied Physics Letters, vol. 76, No. 14, 2000, pp. 1816-1818.
Rigby, P., “A photonic crystal fibre,”Nature, vol. 396, 1998, pp. 415-416.
Rogers, J. et al., “Generating ˜90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask,”J. Vac. Sci. Technol. B 16(1), 1998, pp. 59-68.
Rogers, J. et al., “Quantifying distortions in soft lithography,”J. Vac. Sci. Technol. B 16(1), 1998, pp. 88-97.
Rogers, J. et al., “Wave-front engineering by use of transparent elastomeric optical elements,”Applied Optics, vol. 36, No. 23, 1997, pp. 5792-5795.
Roulet, J. et al., “Microlens systems for fluorescence detection in chemical microsystems,”Opt. Eng., 40(5), 2001, pp. 814-821.
Roulet, J. et al., “Fabrication of Multilayer Systems Combining Microfluidic and Microoptical Elements for Fluorescence Detection,”Journal of Microelectromechanical Systems, vol. 10, No. 4, 2001.
Sasaki, M. et al., “Micro-objective manipulated with optical tweezers,”Applied Physics Letters, 70 (6), 1997, pp. 785-786.
Schwider, J. et al. “Possibilities and limitations of space-variant holographic optical elements for switching networks and general interconnects,”Applied Optics, vol. 31, No. 35, 1992,

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Microlens for projection lithography and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microlens for projection lithography and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microlens for projection lithography and method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3969524

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.