Microlens array and method of forming same and solid-state image

Details Microlens array and method of forming same and solid-state image Microlens array and method of forming same and solid-state image

1998-12-08

2000-12-19

Mack, Ricky

Optical: systems and elements

Single channel simultaneously to or from plural channels

By surface composed of lenticular elements

359620, G02B 2710

Patent

active

061634077

ABSTRACT:
A resist having a three-dimensional shape of a microlens array and a material layer of the microlens array are simultaneously etched under a condition by which planar patterns transferred from the resist to the material layer are larger than planar patterns of the resist. The spacing between microlenses can be made narrower than the spacing between the planar patterns of the resist. Even when the planar shape of the microlens is an ellipse, the curvatures can be optimized in both the row and column directions by making the heights in these directions different from each other. It is possible to provide a microlens array having a small non-focusing region and a solid-state image pickup device having a high sensitivity and little smear.

REFERENCES:
patent: 5119235 (1992-06-01), Umeda et al.
patent: 5177637 (1993-01-01), Tsukada
patent: 5300263 (1994-04-01), Hoopman et al.
patent: 5370768 (1994-12-01), Mersereau et al.
patent: 5371397 (1994-12-01), Maegawa et al.
patent: 5450241 (1995-09-01), Gal et al.

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