Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-11-10
1994-12-27
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 73 2339, 73 6153, 2101982, 210656, G01N 2726, G01N 27447, G01N 3060, B01D 1508
Patent
active
053762525
ABSTRACT:
The microfluidic structure comprises first and second substantially planar form-stable base layers and an intermediate spacing layer of elastic material, said spacing layer being recessed to define a microcavity or channel system with at least one of said first and second base layers. The structure is produced by moulding the spacing layer, optionally applied to or integral with a first base layer, against a planar mould, and the microcavity or channel system is completed by applying a second base layer, and optionally said first base layer, to the spacing layer.
REFERENCES:
patent: 3449938 (1969-06-01), Giddings
patent: 3503712 (1970-03-01), Sussman
patent: 3538744 (1970-11-01), Karasek
patent: 4900663 (1990-02-01), Wie et al.
patent: 4935040 (1990-06-01), Goedert
patent: 5116495 (1992-05-01), Prohaska
patent: 5165292 (1992-11-01), Prohaska
Ekstrom Bjorn
Jacobson Gunilla
Ohman Ove
Sjodin Hakan
Niebling John
Pharmacia Biosensor AB
Starsiak Jr. John S.
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