Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment
Reexamination Certificate
2004-10-18
2010-10-12
Phasge, Arun S (Department: 1795)
Electrolysis: processes, compositions used therein, and methods
Electrolytic material treatment
C203S099000, C204S450000
Reexamination Certificate
active
07811443
ABSTRACT:
A microfluidic dynamic vapor control system adapted to change the chemistry of small drops by dynamically controlling the vapor content surrounding the drops. The small volume surface area ratio makes this an efficient mechanism for controlling chemistry in nanovolumes. The system uses small reservoirs of material that can produce vapor on demand, and microfluidic channels that direct the vapor into a small chamber that holds a drop of the solution of interest. By changing the vapors that enter the chamber, the chemical composition of the drop can be modified.
REFERENCES:
patent: 4642165 (1987-02-01), Bier
patent: 7316781 (2008-01-01), Radomyselski et al.
Ji et al. “Improved protein crystallization by vapor diffusion from drops in contact with transparent, self-assembled monolayers on gold-coated glass coverslips>” (2000) Journal of Crystal Growth 218 pp. 390-398.
Wilson, L.J., Bray, T.L., and Suddath, F. I., Crystallization of proteins by dynamic control of evaporation,Journal of Crystal Growth110 (1991), pp. 142-147.
Smith, H. Wilson and DeLucas, Lawrence J., A method of programmable control of reservoir concentrations for protein crystal growth,Journal of Crystal Growth110 (1991), pp. 137-141.
Bachman Mark
Li Guann-Pyng
Wu Liang
Orrick Herrington & Sutcliffe LLP
Phasge Arun S
The Regents of the University of California
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