Microfluidic dynamic vapor control system

Electrolysis: processes – compositions used therein – and methods – Electrolytic material treatment

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C203S099000, C204S450000

Reexamination Certificate

active

07811443

ABSTRACT:
A microfluidic dynamic vapor control system adapted to change the chemistry of small drops by dynamically controlling the vapor content surrounding the drops. The small volume surface area ratio makes this an efficient mechanism for controlling chemistry in nanovolumes. The system uses small reservoirs of material that can produce vapor on demand, and microfluidic channels that direct the vapor into a small chamber that holds a drop of the solution of interest. By changing the vapors that enter the chamber, the chemical composition of the drop can be modified.

REFERENCES:
patent: 4642165 (1987-02-01), Bier
patent: 7316781 (2008-01-01), Radomyselski et al.
Ji et al. “Improved protein crystallization by vapor diffusion from drops in contact with transparent, self-assembled monolayers on gold-coated glass coverslips>” (2000) Journal of Crystal Growth 218 pp. 390-398.
Wilson, L.J., Bray, T.L., and Suddath, F. I., Crystallization of proteins by dynamic control of evaporation,Journal of Crystal Growth110 (1991), pp. 142-147.
Smith, H. Wilson and DeLucas, Lawrence J., A method of programmable control of reservoir concentrations for protein crystal growth,Journal of Crystal Growth110 (1991), pp. 137-141.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Microfluidic dynamic vapor control system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microfluidic dynamic vapor control system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microfluidic dynamic vapor control system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4196569

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.