Microetching and cleaning of printed wiring boards

Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate

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Details

252 791, 252 792, 252 794, 510175, C11D 904, B44C 122, C03C 1500

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active

058558055

ABSTRACT:
The microetching and cleaning of copper clad substrates in printed wiring board production with solutions containing alkali metal persulfate and sulfuric acid is controlled to provide slower and more consistent copper etch rates by the presence of high proportions of alkali metal sulfate or an alkali metal sulfate/bisulfate mixture in the solutions, in a mole ratio of persulfate to sulfate or sulfate/bisulfate mixture of 1:0.1 to 1:10. When bisulfate is present with the sulfate, the sulfate will comprise at least about 10 mole % of the sulfate/bisulfate mixture. A surfactant may be present in the solutions to aid wettability on the copper clad substrates.

REFERENCES:
patent: 3137600 (1964-06-01), Margulies et al.
patent: 3140203 (1964-07-01), Grunwald
patent: 3227517 (1966-01-01), Leaver et al.
patent: 3305135 (1967-02-01), Lindstrom
patent: 3373114 (1968-03-01), Grunwald
patent: 3470044 (1969-09-01), Radimer
patent: 3887405 (1975-06-01), Fong et al.
patent: 3988254 (1976-10-01), Mori
patent: 4507220 (1985-03-01), Streit et al.
Lore, "Cleaning Copper Chemically" 1PC-TP-251 Paper (13 pages), Sep. 17-21, 1978, San Diego, CA.

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