Microenvironmental sensors

Measuring and testing – Probe or probe mounting

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Details

73DIG4, 29595, 156647, 156662, G01R 300, H01L 21306

Patent

active

050203762

ABSTRACT:
A method of making a microenvironmental sensor for neurological use in which the sensor is formed on a silicon wafer by the use of known integrated circuit techniques. A mask is applied to define the outline of the sensor, trenches are etched surrounding the sensor by the use of an anisotropic etchant and the sensor is separated by etching surplus silicon from the rear surface of the wafer.

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patent: 4872945 (1989-10-01), Myers et al.
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