Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1975-10-30
1977-09-06
Prescott, Arthur C.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204180R, G01N 2726, G01N 2728
Patent
active
040466671
ABSTRACT:
Microelectrophoresis apparatus is provided comprising an electrophoresis chamber, circuit means for impressing a voltage across the chamber, means for generating a light beam to illuminate a portion of the chamber, and a microscope including an objective lens system and an eyepiece for viewing illuminated particles migrating relative to a suspending medium within the chamber under the influence of the applied voltage. Disposed within the microscope between the objective lens system and the eyepiece i.e., internally of the microscope, is a movable optical prism driven by a galvanometer, the drive circuit of which includes an adjustable potentiometer for controlling the rate and direction of movement of the optical prism. Circuit means connected to the galvanometer drive circuit and the circuit applying the voltage potential across the chamber is adapted to develop a signal proportional to the electrophoretic mobility or zeta potential of the migrating particles in the medium in the chamber when the rate of movement of the optical prism is adjusted such that it cancels the transfer velocity of the migrating particles and the particles appear stationary when observed through the eyepiece of the microscope.
REFERENCES:
patent: 3454487 (1969-07-01), Riddick
patent: 3764512 (1973-10-01), Greenwood et al.
patent: 3793180 (1974-02-01), Flower et al.
Pen Kem, Inc.
Prescott Arthur C.
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