Microelectronic wire bonding using friction welding process

Metal fusion bonding – Process – Using dynamic frictional energy

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2281805, H01L 21603

Patent

active

057159890

ABSTRACT:
A method of low temperature securing a wire to a bond pad in a microelectronic semiconductor device which includes providing a semiconductor die having a bond pad thereon and providing a wire to be secured to the bond pad. One of the bond pad and wire is rotated relative to the other and the pad is contacted with the wire while the bond pad and the wire are rotating relative to each other until the interface of the wire and the bond pad diffuse into each other sufficiently to provide a bond therebetween upon cooling to secure the wire to the bond pad. Preferably the die is stationary and the wire is rotated. The wire is then cut to a predetermined length. By this method, it is possible to weld together dissimilar metals as well as metals which were previously no available in the fabrication procedures being utilized such as, for example, wherein the wire and the bond pad are both copper, wherein the wire is copper and the bond pad is aluminum, or wherein the wire is copper and the bond pad is titanium tungsten.

REFERENCES:
patent: 3296692 (1967-01-01), Griffin
patent: 4542843 (1985-09-01), Middleton
patent: 4628150 (1986-12-01), Luc
patent: 5277356 (1994-01-01), Kawauchi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Microelectronic wire bonding using friction welding process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microelectronic wire bonding using friction welding process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microelectronic wire bonding using friction welding process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2070907

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.