Microelectronic assemblies having very fine pitch stacking

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Assembly of plural semiconductive substrates each possessing...

Reexamination Certificate

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C438S106000, C438S108000, C438S109000, C438S118000, C438S121000, C438S123000

Reexamination Certificate

active

08067267

ABSTRACT:
A method of making a stacked microelectronic assembly includes providing a first microelectronic package that includes a first substrate having a first dielectric layer, conductive posts, and conductive traces extending along the surface of the first dielectric layer; providing a second microelectronic package including a second substrate that includes a second dielectric layer; securing a microelectronic element to one of the surfaces of at least one of the first or second substrates; and joining the conductive posts of the first substrate with the fusible masses of the second substrate. The posts may include a plurality of aligned posts which are aligned in a first row extending in a single orthogonal direction along a surface of the first substrate away from a portion of the first substrate that faces a face of the microelectronic element. The aligned posts are disposed beyond one of the edges of the microelectronic element.

REFERENCES:
patent: 4695870 (1987-09-01), Patraw
patent: 4716049 (1987-12-01), Patraw
patent: 4791075 (1988-12-01), Lin
patent: 4804132 (1989-02-01), Difrancesco
patent: 4902600 (1990-02-01), Tamagawa et al.
patent: 4924353 (1990-05-01), Patraw
patent: 4975079 (1990-12-01), Beaman et al.
patent: 4982265 (1991-01-01), Watanabe et al.
patent: 4991000 (1991-02-01), Bone et al.
patent: 5083697 (1992-01-01), Difrancesco
patent: 5138438 (1992-08-01), Masayuki et al.
patent: 5148265 (1992-09-01), Khandros et al.
patent: 5148266 (1992-09-01), Khandros et al.
patent: 5189505 (1993-02-01), Bartelink
patent: 5196726 (1993-03-01), Nishiguchi et al.
patent: 5214308 (1993-05-01), Nishiguchi et al.
patent: 5222014 (1993-06-01), Lin
patent: 5229647 (1993-07-01), Gnadinger
patent: 5397997 (1995-03-01), Tuckerman et al.
patent: 5432999 (1995-07-01), Capps et al.
patent: 5455390 (1995-10-01), DiStefano et al.
patent: 5518964 (1996-05-01), DiStefano et al.
patent: 5615824 (1997-04-01), Fjelstad et al.
patent: 5656550 (1997-08-01), Tsuji et al.
patent: 5659952 (1997-08-01), Kovac et al.
patent: 5679977 (1997-10-01), Khandros et al.
patent: 5726493 (1998-03-01), Yamashita et al.
patent: 5731709 (1998-03-01), Pastore et al.
patent: 5802699 (1998-09-01), Fjelstad et al.
patent: 5811982 (1998-09-01), Beaman et al.
patent: 5818748 (1998-10-01), Bertin et al.
patent: 5854507 (1998-12-01), Miremadi et al.
patent: 5861666 (1999-01-01), Bellaar
patent: 5973391 (1999-10-01), Bischoff et al.
patent: 5980270 (1999-11-01), Fjelstad et al.
patent: 6032359 (2000-03-01), Carroll
patent: 6052287 (2000-04-01), Palmer et al.
patent: 6054756 (2000-04-01), DiStefano et al.
patent: 6133626 (2000-10-01), Hawke et al.
patent: 6177636 (2001-01-01), Fjelstad
patent: 6188127 (2001-02-01), Senba et al.
patent: 6202297 (2001-03-01), Faraci et al.
patent: 6258625 (2001-07-01), Brofman et al.
patent: 6332270 (2001-12-01), Beaman et al.
patent: 6358627 (2002-03-01), Benenati et al.
patent: 6362525 (2002-03-01), Rahim
patent: 6383840 (2002-05-01), Hashimoto et al.
patent: 6451626 (2002-09-01), Lin et al.
patent: 6458411 (2002-10-01), Goossen et al.
patent: 6476503 (2002-11-01), Imamura et al.
patent: 6495914 (2002-12-01), Sekine et al.
patent: 6509639 (2003-01-01), Lin et al.
patent: 6514847 (2003-02-01), Ohsawa et al.
patent: 6515355 (2003-02-01), Jiang et al.
patent: 6522018 (2003-02-01), Tay et al.
patent: 6525413 (2003-02-01), Cloud et al.
patent: 6550666 (2003-04-01), Chew et al.
patent: 6555918 (2003-04-01), Masuda et al.
patent: 6560117 (2003-05-01), Moon
patent: 6578754 (2003-06-01), Tung
patent: 6624653 (2003-09-01), Cram
patent: 6642615 (2003-11-01), Hashimoto et al.
patent: 6647310 (2003-11-01), Yi et al.
patent: 6683374 (2004-01-01), Goller et al.
patent: 6706557 (2004-03-01), Koopmans
patent: 6756305 (2004-06-01), Conn
patent: 6765287 (2004-07-01), Lin
patent: 6782610 (2004-08-01), Iijima et al.
patent: 6794741 (2004-09-01), Lin et al.
patent: 6847105 (2005-01-01), Koopmans
patent: 6884709 (2005-04-01), Iijima et al.
patent: 6902869 (2005-06-01), Appelt et al.
patent: 6962865 (2005-11-01), Hanaoka et al.
patent: 7067911 (2006-06-01), Lin et al.
patent: 2001/0028105 (2001-10-01), Hashimoto et al.
patent: 2002/0125571 (2002-09-01), Corisis et al.
patent: 2002/0153602 (2002-10-01), Tay et al.
patent: 2003/0042590 (2003-03-01), Goller et al.
patent: 2003/0057539 (2003-03-01), Koopmans
patent: 2003/0164540 (2003-09-01), Lee et al.
patent: 2003/0164551 (2003-09-01), Lee et al.
patent: 2003/0189257 (2003-10-01), Corisis et al.
patent: 2003/0203537 (2003-10-01), Koopmans
patent: 2004/0061212 (2004-04-01), Karnezos
patent: 2004/0121632 (2004-06-01), Takata
patent: 2004/0197962 (2004-10-01), Iijima et al.
patent: 2004/0201096 (2004-10-01), Iijima et al.
patent: 2004/0241908 (2004-12-01), Choi
patent: 2004/0251523 (2004-12-01), Takiar
patent: 2005/0000729 (2005-01-01), Iljima et al.
patent: 2005/0009329 (2005-01-01), Tanida et al.
patent: 2005/0014311 (2005-01-01), Hayasaka et al.
patent: 2005/0097727 (2005-05-01), Iijima et al.
patent: 2005/0161804 (2005-07-01), Iijima et al.
patent: 2006/0012037 (2006-01-01), Raedt et al.
patent: 62-68015 (1994-09-01), None
Neo-Manhattan Technology, A Novel HDI Manufacturing Process, “High-Density Interconnects for Advanced Flex Substrates & 3-D Package Stacking,” IPC Flex & Chips Symposium, Tempe, AZ, Feb. 11-12, 2003.
North Corporation, “Processed Intra-layer Interconnection Material for PWBs [Etched Copper Bump with Copper Foil],” NMBI™, Version 2001.6.
North Corporation “NMBI® •NMSS™ Technical Doocument” The First Edition, Oct. 25, 2003.

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