Etching a substrate: processes – Gas phase etching of substrate
Reexamination Certificate
2006-12-26
2006-12-26
Norton, Nadine (Department: 1765)
Etching a substrate: processes
Gas phase etching of substrate
C430S327000, C359S224200, C359S872000, C359S245000, C216S079000, C216S073000, C438S021000, C438S048000
Reexamination Certificate
active
07153443
ABSTRACT:
A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.
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Doan Jonathan
Patel Satyadev
Brady III W. James
George Patricia A.
Norton Nadine
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
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