Microdynamic release structure

Details Microdynamic release structure Microdynamic release structure

1989-02-21

1991-12-10

Hille, Rolf

Electrical generator or motor structure

Dynamoelectric

Rotary

357 65, 357 26, 357 27, 310309, 310311, 310330, 310332, H01L 2348, H01L 2944

Patent

active

050722883

ABSTRACT:
A selective chemical vapor deposition (CVD) tungsten process is used to fabricate three-dimensional tungsten cantilever beams on a substrate. Two beams form micromechanical tweezers that move in three dimensions by the application of potential differences between the beams, and between the beams and the silicon substrate. A high deposition rate selective tungsten CVD process is used to fabricate beams of greater than 3 micrometers thickness in patterned, CVD silicon dioxide trenches ion-implanted with silicon. Tweezers 200 micrometers in length with a cross section of 2.7 by 2.5 micrometers will close upon application of a voltage of less than 150 volts.

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