Microdevice for gas and vapor sensing

Details Microdevice for gas and vapor sensing Microdevice for gas and vapor sensing

1987-10-02

1990-01-09

Richman, Barry S.

Chemical apparatus and process disinfecting, deodorizing, preser

Analyzer, structured indicator, or manipulative laboratory...

Means for analyzing gas sample

422 83, 338 34, 338 35, H01L 700, H01C 1300

Patent

active

048927090

ABSTRACT:
In accordance with the present invention a microdevice 10 is set forth for gas sensing. The microdevice 10 includes a conductive substrate 12 having an insulator layer 14 on a surface 16 thereof, the insulator layer 14 having an opening 18 therethrough exposing a portion 20 of the surface 16. A conducting member 22 is in contact with the insulator layer 14. The member 22, the insulator layer 14 and the portion 20 of the surface 16 define an ionization chamber 28. Gas can flow through the ionization chamber 28. A potential difference is applied between the substrate 12 and the member 22. The current flowing between the substrate 12 and the member 22 is measured. A microdevice 10 as disclosed herein uses very little power and has very high sensitivity.

REFERENCES:
patent: 4041437 (1977-08-01), Matsuura et al.
patent: 4378691 (1983-04-01), Terada et al.
patent: 4482581 (1984-11-01), Lorin et al.
patent: 4651121 (1987-03-01), Furubayashi et al.
patent: 4723439 (1988-02-01), Asakura et al.

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