Microcrystalline silicon thin film transistor and method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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C257S061000, C257S064000, C257S072000, C257SE29117, C257SE29277, C257S029000

Reexamination Certificate

active

08039844

ABSTRACT:
This invention provides a top-gate microcrystalline thin film transistor and a method for manufacturing the same. An inversion layer channel is formed in a top interface of a microcrystalline active layer, and being separated from an incubation layer in a bottom interface of the microcrystalline active layer. The inversion layer channel is formed in the crystallized layer of the top interface of the microcrystalline active layer. As such, the present microcrystalline thin film transistor has better electrical performance and reliability.

REFERENCES:
patent: 5473168 (1995-12-01), Kawai et al.
patent: 6677191 (2004-01-01), Battersby
patent: 6680486 (2004-01-01), Yamazaki
patent: 6759711 (2004-07-01), Powell
patent: 2005/0258427 (2005-11-01), Chan et al.
Kunal S. Girotra, JunHyung Souk, Kyuha Chung, Soonkwon Um, Shiyul Kim, Byoung-Jun. Kim, Sung-Hoon Yang, Beohmrock Choi, Joonchul Goh, Young-Rok Song, Yong-Mo Choi; “70.4 A 14.1 inch AMOLED Display using Highly Stable PECVD based Microcrystalline Silicon TFT Backplane”, 70.4/ K.S. Girotra p. 1972-1975.

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