Microcavity capacitive device

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

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257296, 257534, 438396, H01L 2900

Patent

active

056660006

ABSTRACT:
A method is presented for controlled formation of microcavities for various semiconductor and micro-machine applications. The method involves the steps of defining a void in a support structure, sealing the void with a resilient gas-permeable material such that a chamber is formed, diffusing gas into the chamber through the gas permeable material to create a pressurized chamber, and then allowing expansion of the pressurized chamber within the resilient material, thereby creating an enlarged cavity. The applications set forth include the production of large capacitors, field isolation structures, tubular sensors for chromatography, pressure sensors, and cooling channels for integrated circuits.

REFERENCES:
patent: 3702427 (1972-11-01), Learn et al.
patent: 4475120 (1984-10-01), Binet
patent: 5248564 (1993-09-01), Ramesh
patent: 5514564 (1996-05-01), Dusablon, Sr. et al.

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