Microanalysis by pulse laser emission spectroscopy

Details Microanalysis by pulse laser emission spectroscopy Microanalysis by pulse laser emission spectroscopy

1979-11-06

1981-03-31

Anderson, Bruce C.

Radiant energy

Radiation tracer methods

250461R, G09K 300

Patent

active

042595746

ABSTRACT:
A system for detecting and identifying the composition of a material, such as semiconductor wafers and chips, subject to one or more stages of processing. The material is laser irradiated to induce molecular fluorescence with means to detect the decay rate of the fluorescence. The decay rate is then compared with a decay record of fluorescence of acceptable modifications of the material, inclusive of amalgamated contaminants or impurities (e.g. doped regions) to determine the state of the modification of the material.

REFERENCES:
patent: 3832558 (1974-08-01), Fern
patent: 4006360 (1977-02-01), Mueller
patent: 4058732 (1977-11-01), Wieder
patent: 4087685 (1978-05-01), Froot

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