Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material
Reexamination Certificate
2005-11-29
2005-11-29
Kennedy, Jennifer (Department: 2812)
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Grooved and refilled with deposited dielectric material
C429S047000, C429S047000, C429S047000
Reexamination Certificate
active
06969664
ABSTRACT:
A fuel cell for an electrical load circuit includes a first monocrystalline silicon substrate and a positive half-cell formed therein, and a second monocrystalline silicon substrate and a positive half-cell formed therein. Each half-cell includes a microporous catalytic electrode permeable to a gas and connectable to the electrical load circuit. A cell area is defined on a surface of each respective monocrystalline silicon substrate, and includes a plurality of parallel trenches formed therein for receiving the gas to be fed to the respective microporous catalytic electrode. A cation exchange membrane separates the two microporous catalytic electrodes. Each half-cell includes a passageway for feeding the respective gas to the corresponding microporous catalytic electrode.
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Coffa Salvatore
D'Arrigo Giuseppe
Spinella Rosario Corrado
Allen Dyer Doppelt Milbrath & Gilchrist, P.A.
Jorgenson Lisa K.
Kennedy Jennifer
STMicroelectronics S.r.l.
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