Micro secondary electron multiplier

Details Micro secondary electron multiplier Micro secondary electron multiplier

1988-03-17

1991-02-05

Yusko, Donald J.

Electric lamp and discharge devices

Photosensitive

Photomultiplier

313103R, 313105R, H01J 4318

Patent

active

049908278

ABSTRACT:
A micro secondary electron multiplier or an array thereof employs discrete dynodes which are microstructured and applied to an insulating substrate plate. The substrate plate is provided with electrical conductor paths for the connection of the dynodes. The dynodes can be made using a technique such as X-ray depth lithography-galvanoplasty (the LIGA technique). The micro secondary electron multiplier or an array of such multipliers is extremely small and sensitive, and has a high time resolution. Furthermore there is considerable flexibility in positioning the multipliers of an array.

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E. W. Becker et al, "Herstellung von Mikrostrukturen mit grossem Aspektverhaltnis und grosser Strukturhohe durch Rontgentiefenlithographie mit Synchrotronstrahlung, Galvanoformung und Kunststoffabformung (LIGA-Verfahren)" KFK Report 3995 (12-1985), pp. 0-33.

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