Fishing – trapping – and vermin destroying
Patent
1993-12-16
1995-11-14
Thomas, Tom
Fishing, trapping, and vermin destroying
437 52, 437233, 437919, 437971, 148DIG105, H01L 218242
Patent
active
054666260
ABSTRACT:
The subject invention provides a method of forming recesses in a substrate such as a capacitor so as to increase the surface area thereof and therefore the charge storage capacity of the capacitor. This is accomplished by utilizing a micro mask formed by agglomeration on the surface of the substrate. The agglomerated material, such as gold, titanium nitride or titanium silicide, is used as a mask for selectively etching the substrate to form recesses therein. Alternatively, an oxide transfer mask can be utilized with the agglomerated material micro mask to etch the substrate.
REFERENCES:
patent: 4671849 (1987-06-01), Chen et al.
patent: 5102832 (1992-04-01), Tuttle
patent: 5108569 (1992-04-01), Giboa et al.
patent: 5112773 (1992-05-01), Tuttle
patent: 5134086 (1992-07-01), Ahm
patent: 5134086 (1992-07-01), Ahn
patent: 5149676 (1992-09-01), Kim et al.
patent: 5169803 (1992-12-01), Miyakawa
patent: 5240558 (1993-08-01), Kawasaki et al.
patent: 5254503 (1993-10-01), Kenney
patent: 5270263 (1993-12-01), Kim et al.
patent: 5302540 (1994-04-01), Ko et al.
P. C. Fazan and A. Ditali, "Electrical Characterization of Textured Interpoly Capacitors For Advanced Stacked DRAMs", IEDM #27.5.1-27.5.4, pp. 663-666 (1990).
M. Sakao et al., "A Capacitor-Over-Bit-Line (COB) Cell With A Hemispherical-Grain Storage Node For 64Mb DRAMs", IEDM 27.3.1-27.3.4, pp. 655-658 (1990).
Y. Yoshimaru et al., "Rugged Surface Poly-Si Electrode And Low Temperature Deposited Si.sub.3 N.sub.4 For 64 MBIT And Beyond STC DRAM Cell", IEDM #27.4.1-27.4.4, pp. 659-662 (1990).
Armacost Michael
Baker, Jr. A. Richard
Berry Wayne S.
Carl Daniel A.
Kenney Donald M.
International Business Machines - Corporation
Thomas Tom
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