Micro-lenses and method for increasing area coverage and...

Details Micro-lenses and method for increasing area coverage and... Micro-lenses and method for increasing area coverage and...

2008-05-27

2008-05-27

McPherson, John A. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

C430S330000

Reexamination Certificate

active

07378199

ABSTRACT:
Micro-lenses for use in imagers and their method of manufacture from intermediate lens structures are described. Lithographic masks are used to remove unwanted portions from the intermediate lens structures and to remove cut-out portions from the intermediate lens structures to alter the radius of the resultant micro-lenses. Lithographic masks are also used to inhibit pull-back of the micro-lenses during a reflow step.

REFERENCES:
patent: 5561008 (1996-10-01), Berger et al.
patent: 5633527 (1997-05-01), Lear
patent: 6707612 (2004-03-01), Ohtsu et al.
patent: 11-048354 (1999-02-01), None

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