Micro fabrication process for semiconductor structure using cohe

Details Micro fabrication process for semiconductor structure using cohe Micro fabrication process for semiconductor structure using cohe

1986-12-15

1988-05-31

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437176, 437129, 437173, 437203, 437229, 437245, 437928, 430 1, 430329, 2504923, 148DIG46, 148DIG72, 148DIG137, G03C 500, H01L 21203

Patent

active

047481323

ABSTRACT:
As a process for fabricating uniform patterns fine enough to produce a quantum size effect, the use of electron halography is proposed. Disclosed examples employing a process are methods of manufacturing a semiconductors laser whose threshold current is approximately 1 mA, and a permeable transistor and bistable device whose response rates are 100 GHz.

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